Fei Zhang, Yujia Wu, Zhaoqiang Liu, University of Electronic Science and Technology of China, China

Chenqi Shi, Qiang Niu, China University of minging and technology, China; Guangzhen Yao, National University of Defense Technology, China; Wenxin Zhang, University of Chinese Academy of Science, China; Zhenyu Yu, University Malaya, China

Yang-Hsi Su, University of Michigan, United States of America; Thomas Landemaine, Miriam Israelowitz, Bose, United States of America

Yijia Song, Juliet Biggs, Alin Achim, Robert Popescu, Simon Orrego, Nantheera Anantrasirichai, University of Bristol, United Kingdom of Great Britain and Northern Ireland

Xingze Wang, Yuan Liu, Andy W. H. Khong, Nanyang Technological University, Singapore; Tzu-Yi Hung, Delta Electronics, Singapore

Huaxin Hou, Sheng Xu, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, China; K.C. Ho, University of Missouri, United States of America; Mingxue Cai, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, China; Kutluyil Dogancay, Adelaide University, Australia; Tiantian Xu, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, China

Jiahui Cao, Zhibo Yang, Xi'an Jiaotong University, China; Asoke K. Nandi, Brunel University of London, United Kingdom of Great Britain and Northern Ireland

Ivana Nikoloska, Hamdi Joudeh, Ruud van Sloun, Eindhoven University of Technology, Netherlands; Osvaldo Simeone, Northeastern University London, United Kingdom of Great Britain and Northern Ireland

Yiqi Chen, China Telecom Beijing Research Institute, China; Jiayi Zhao, Beijing University of Posts and Telecommunications, China; Jianchi Zhu, Nanxi Li, Zhenqiao Cheng, China Telecom Beijing Research Institute, China

Jiahui Cao, Zhibo Yang, Xi'an Jiaotong University, China; Asoke K. Nandi, Brunel University of London, United Kingdom of Great Britain and Northern Ireland