Noriyuki Tonami, NEC Corporation, Japan; Wataru Kohno, NEC Laboratories America, Inc., Japan; Sakiko Mishima, Yumi Arai, Reishi Kondo, Tomoyuki Hino, NEC Corporation, Japan

Xiaohu Li, Jiawei Liu, Guorui Liao, Chongqing University, China; Mingrui Yin, Zhejiang University, China; Shu Wang, Southwest University, China; Guoxin Su, University of Wollongong, Australia; Jun Liao, Li Liu, Chongqing University, China

Sebastian Jordan, Delft University of Technology, Netherlands; Qiongxiu Li, Tsinghua University, China; Richard Heusdens, Delft University of Technology/Netherlands Defence Academy, Netherlands

Wentao He, Yuchen Yan, Jianfeng Ren, Ruibin Bai, University of Nottingham Ningbo China, China; Xudong Jiang, Nanyang Technological University, Singapore

Ilya Gurvich, Ido Leichter, Dharmendar Reddy Palle, Yossi Asher, Alon Vinnikov, Igor Abramovski, Vishak Gopal, Ross Cutler, Eyal Krupka, Microsoft Corporation, Israel

Ziyu Zhou, Wei Dai, Imperial College London, United Kingdom of Great Britain and Northern Ireland

Hanqin Gong, Dongheng Zhang, Jinbo Chen, Yadong Li, Guixin Xu, Yuqin Yuan, Yang Hu, Yan Chen, University of Science and Technology of China, China

Patitapaban Palo, Aurobinda Routray, Ritesh Chandra Tewari, IIT Kharagpur, India

Weichao Zheng, Zai Yang, Xi’an Jiaotong University, China

Huiping Huang, Chalmers University of Technology, Sweden; Tianjian Zhang, Feng Yin, The Chinese University of Hong Kong, China; Bin Liao, Shenzhen University, China; Henk Wymeersch, Chalmers University of Technology, Sweden

Pranav Kulkarni, P. P. Vaidyanathan, California Institute of Technology, United States of America

Jie Yang, Yixin Yang, Northwestern Polytechnical University, China; Bin Liao, Shenzhen University, China