Joel S., Shekhar Kumar Yadav, Nithin V. George, Indian Institute of Technology Gandhinagar, India

Junyang Liu, The Hong Kong Polytechnic University, Hong Kong; Weicheng Zhao, Harbin Institute of Technology, China; Qingping Wang, National University of Defence Technology, China; Xiangtian Meng, Harbin Institute of Technology at Weihai, China; Maria Greco, Fulvio Gini, University of Pisa, Italy

Ziyu Zhou, Wei Dai, Imperial College London, United Kingdom of Great Britain and Northern Ireland

Ryuhei Takahashi, Mitsubishi Electric Corporation, Japan; Hassan Mansour, Petros Boufounos, Mitsubishi Electric Research Laboratories (MERL), United States of America

Feiyang Qian, Chengwei Zhou, Zhiguo Shi, Zhejiang University, China

Rajat Bhattacharjya, University of California, Irvine, United States of America; Woohyeok Park, Kookmin University, Korea, Republic of; Arnab Sarkar, Indian Institute of Technology, Kharagpur, India; Hyunwoo Oh, Mohsen Imani, Nikil Dutt, University of California, Irvine, United States of America

Ruifu Li, Danijela Cabric, UCLA, United States of America

Omikumar Bhavinkumar Makadia, Georgios Andreadis, Anastasios Kleniatis, Ivan Seskar, Narayan Mandayam, Aggelos Bletsas, Rutgers University, United States of America

Weichao Zheng, Zai Yang, Xi’an Jiaotong University, China

Kuntal Panwar, Bhavani Shankar M. R., University of Luxembourg, Luxembourg; Linlong Wu, University of Electronic Science and Technology of China (UESTC), China; Prabhu Babu, Indian Institute of Technology, Delhi, India